Welcome to the group Plasma & Materials Processing (P&MP), which is led by Prof.dr.ir. Erwin Kessels together with the staff members Dr. Richard Engeln, Dr. Adriana  Creatore, Dr. Ageeth Bol, and the part-time staff members Prof.dr.ir. Richard van de Sanden, Prof.dr. Fred Roozeboom, Prof.dr. Ruud Schropp, Prof.dr.ir. Daniel Schram (emeritus) and Dr. Marcel Verheijen.

News & Press

• Semiconductor Science and Technology (SST) article of Jan-Pieter van Delft about ALD4PV has been selected as a Highlight of 2012
• Bart Macco wins the NEVAC student award for best scientific article in the field of vacuum science and technology.
• Bart Macco made it to the finals of the Shell Master prize 2012, a prize awarded to the best master thesis related to technology and innovation. The finals will be on March 13, 2013 at the university of Twente, the Netherlands.

Latest Publications

• Hydrogen–argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel
  E. Härkönen et al., Thin Solid Films 534 (2013) 384
• Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution
  I. Dogan et al., J. Appl. Phys. 113 (2013) 134306
• Crystallization study by transmission electron microscopy of SrTiO3 thin films prepared by plasma-assisted ALD
  V. Longo et al.,ECS J. Solid State Sci. Technol. 2 (2013) N120