prof.dr. F. (Fred) Roozeboom - Expertise
P.O. Box 513
5600 MB EINDHOVEN
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- D14320 - Microelectronics
Fred Roozeboom is Full Professor in the Plasma and Materials Processing group in the Applied Physics department at Eindhoven University of Technology (TU/e). Roozeboom’s research interests include ultrathin-film technology, plasma processing, spatial ALD (including roll-to-roll), RTP, reactive ion etching, 3D passive and heterogeneous integration, microsystem technology, Li-ion microbatteries, sensors, and displays.
As Associate Professor at TU/e, Roozeboom previously led a team working on silicon-based 3D passives and Li-ion microbatteries, and heterogeneous integration into System-in-Package products in wireless communication, power management and digital signal processing. For part of this work he received the Bronze Award of the ‘NXP Invention of the Year 2007’ and became an NXP Research Fellow.
In 2009, Roozeboom left NXP and joined TNO as a senior technical advisor working in a team specializing in spatial atmospheric Atomic Layer Deposition and other high-speed processing. In 2011, the spatial processing team received the 2nd EARTO Innovation Prize Award.
As a member of The Electrochemical Society, Roozeboom serves or has served as a member-at-large of the Electronics and Photonics Division.
Fred Roozeboom received his MSc in Chemistry (cum laude) from Utrecht University in 1976 and his PhD in Chemical Engineering in 1980 from Twente University. From 1980 to 1983, he worked on zeolite catalysis with Exxon R&D Labs, first in Baton Rouge, USA (1980 to 1982), and then with Exxon Chemicals in Rotterdam (1983). In 1983, he joined Philips Research (since 2006: NXP Research) in Eindhoven. Roozeboom became part-time professor within the Plasma & Materials Processing group in the Applied Physics department at Eindhoven University of Technology (TU/e) in 2007. He left Philips in 2009, after working on various projects there since 1983, to become Senior Technical Advisor at TNO Science & Technology.