Synergy between plasma-assisted ALD and roll-to-roll atmospheric pressure PE-CVD processing of moisture barrier films on polymers
ArticleStarostin, S.A., Keuning, W., Schalken, J.R.G., Creatore, M., Kessels, W.M.M., Bouwstra, J.B., Sanden, van de, M.C.M. & Vries, de, H.W. (2016). Synergy between plasma-assisted ALD and roll-to-roll atmospheric pressure PE-CVD processing of moisture barrier films on polymers. Plasma Processes and Polymers, 13(3), 311-315. In Scopus Cited 11 times.
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The synergy between fast (1600 nm · min−1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic water vapor transmission rates (WVTR) were studied as a function of the number of ALD cycles. It was demonstrated that a synergistic combination of a silica buffer layer deposited on polymer with an ultra-thin (≤ 2 nm) alumina barrier film can provide excellent intrinsic (10−5–10−6 g · m−2 · day−1) and good effective (∼10−3 g · m−2 · day−1) WVTR values, whereas both single layers individually exhibit poor barrier performances with effective WVTR values of ≥ 1.0 g · m−2 · day−1