As much as we enjoy exploring new fields of application, our research has always been based on one underlying interest: the elementary processes in and the physics of plasmas.
In the EPG group, we use our thorough understanding of elementary processes to develop predictive models of a large range of plasmas. These models take into account the intensity and effectivity of processes such as ionization, recombination, transport, radiation, excitation, de-excitation, chemical reactions and surface processes.
We integrate state-of-the art plasma diagnostics (imaging, passive and active spectroscopy) and advanced plasma models that enable plasma users to optimize the plasma source for their specific application. Over the years, the group has worked on a wide range of applications: plasma etching, lighting, medical applications and so much more.
Meet some of our Researchers
Gerard van Rooij
Eddie van Veldhuizen
Jan van Dijk
Our most recent peer reviewed publications
Oxygen content dependent etch rate of single polymer microparticles confined in the sheath region of a low pressure radiofrequency argon/oxygen plasmaJournal of Physics D: Applied Physics (2018)
How dielectric, metallic and liquid targets influence the evolution of electron properties in a pulsed He jet measured by Thomson and Raman scatteringPlasma Sources Science and Technology (2018)
Atmospheric pressure plasma jet in controlled atmospherePlasma Sources Science and Technology (2018)
How the alternating degeneracy in rotational Raman spectra of CO2 and C2H2 reveals the vibrational temperatureApplied Optics (2018)
The effect of DC voltage polarity on ionic wind in ambient air for cooling purposesPlasma Sources Science and Technology (2018)