As much as we enjoy exploring new fields of application, our research has always been based on one underlying interest: the elementary processes in and the physics of plasmas
In the EPG group, we use our thorough understanding of elementary processes to develop predictive models of a large range of plasmas. These models take into account the intensity and effectivity of processes such as ionization, recombination, transport, radiation, excitation, de-excitation, chemical reactions and surface processes.
We integrate state-of-the art plasma diagnostics (imaging, passive and active spectroscopy) and advanced plasma models that enable plasma users to optimize the plasma source for their specific application. Over the years, the group has worked on a wide range of applications: plasma etching, lighting, medical applications and so much more.
Meet some of our Researchers
Gerard van Rooij
Jan van Dijk
Eddie van Veldhuizen
Our most recent peer reviewed publications
Langmuir probe measurements in nanodust containing argon-acetylene plasmasVacuum (2019)
The charge of micro-particles in a low pressure spatial plasma afterglowJournal of Physics D: Applied Physics (2019)
The relation between the load, duration, and steam penetration capacity of a surface steam sterilization processPDA Journal of Pharmaceutical Science and Technology (2019)
Plasma-surface interactionPlasma Sources Science and Technology (2019)
Energy distribution functions for ions from pulsed EUV-induced plasmas in low pressure N2-diluted H2 gasApplied Physics Letters (2019)