As much as we enjoy exploring new fields of application, our research has always been based on one underlying interest: the elementary processes in and the physics of plasmas.
In the EPG group, we use our thorough understanding of elementary processes to develop predictive models of a large range of plasmas. These models take into account the intensity and effectivity of processes such as ionization, recombination, transport, radiation, excitation, de-excitation, chemical reactions and surface processes.
We integrate state-of-the art plasma diagnostics (imaging, passive and active spectroscopy) and advanced plasma models that enable plasma users to optimize the plasma source for their specific application. Over the years, the group has worked on a wide range of applications: plasma etching, lighting, medical applications and so much more.
Meet some of our Researchers
Gerard van Rooij
Eddie van Veldhuizen
Jan van Dijk
Our most recent peer reviewed publications
Investigation of a plasma-target interaction through electric field characterization examining surface and volume charge contributions: modeling and experimentPlasma Sources Science and Technology (2018)
Tuning of conversion and optical emission by electron temperature in inductively coupled CO2 plasmaJournal of Physical Chemistry C (2018)
Studying the influence of nitrogen seeding in a detached-like hydrogen plasma by means of numerical simulationsPlasma Physics and Controlled Fusion (2018)
Oxygen content dependent etch rate of single polymer microparticles confined in the sheath region of a low pressure radiofrequency argon/oxygen plasmaJournal of Physics D: Applied Physics (2018)
How dielectric, metallic and liquid targets influence the evolution of electron properties in a pulsed He jet measured by Thomson and Raman scatteringPlasma Sources Science and Technology (2018)