As much as we enjoy exploring new fields of application, our research has always been based on one underlying interest: the elementary processes in and the physics of plasmas.
In the EPG group, we use our thorough understanding of elementary processes to develop predictive models of a large range of plasmas. These models take into account the intensity and effectivity of processes such as ionization, recombination, transport, radiation, excitation, de-excitation, chemical reactions and surface processes.
We integrate state-of-the art plasma diagnostics (imaging, passive and active spectroscopy) and advanced plasma models that enable plasma users to optimize the plasma source for their specific application. Over the years, the group has worked on a wide range of applications: plasma etching, lighting, medical applications and so much more.
Meet some of our Researchers
Jan van Dijk
Eddie van Veldhuizen
Gerard van Rooij
Our most recent peer reviewed publications
Mapping electron dynamics in highly transient EUV photon-induced plasmasJournal of Physics D: Applied Physics (2019)
CorrigendumJournal of Physics D: Applied Physics (2019)
AfivoComputer Physics Communications (2018)
Evaluation of Monte Carlo tools for high-energy atmospheric physics IIGeoscientific Model Development (2018)
Determination of microparticle characteristics in an etching plasmaContributions to Plasma Physics (2018)