Atomic scale processing for future device technologies
Whether it is in the field of nanoelectronics, photonics, photovoltaics or quantum technology, future device technologies will heavily depend on atomic scale processing techniques such as atomic layer deposition (ALD) and atomic layer etching (ALE). These techniques allow for atomic-scale control and they provide many opportunities for bottom-up processing of the multitude of materials that will make up future devices. With our research we try to develop advanced processes that will enable these future device technologies. Current interests include thermal and plasma-assisted ALD and ALE processes as well as area- and topographically-selective processing. Very importantly, it also involves fundamental studies of the underlying reaction mechanisms through advanced in situ studies coupled to atomistic modelling. Our direct research partners are mostly equipment manufacturers and suppliers of chemicals.
Our most recent peer reviewed publications
Ceria-Supported Cobalt Catalyst for Low-Temperature Methanation at Low Partial Pressures of CO2Angewandte Chemie - International Edition (2023)
Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of NanodevicesACS Applied Nano Materials (2022)
Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulationsJournal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films (2022)
Atomic layer deposition of conductive and semiconductive oxidesApplied Physics Reviews (2022)
Alumina-Supported NiMo Hydrotreating CatalystsAspects of 3D Structure, Synthesis, and ActivityJournal of Physical Chemistry C (2022)