Interface engineering for next generation energy technologies
Our approach is multidisciplinary, as it embraces material science and solid-state physics, together with the integration of atomically grown thin films and interfaces in devices. Moreover, the design and engineering of interfaces for future energy technologies require atomic scale processing to go beyond its state-of-the art. This is the case of ALD processing on 'chemically challenging substrates', such as metal halide perovskite absorbers for single and tandem photovoltaics devices. This application field demands advancement in the level of control in ALD growth to avoid modification of the perovskite surface and bulk chemistry. Scientifically, we pursue this goal by gaining insights, with the aid of in situ diagnostics, into the ALD surface reactions and film growth mechanisms on perovskite. Another exciting example is the field of (electro-)catalysis. When 'borrowing' from ALD the principle of digital design of materials, we can synthesize electro-catalysts with atomic precision in terms of morphology, chemical composition and size and distribution of (nano-)particles.
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Recent Publications
Our most recent peer reviewed publications
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The 2022 applied physics by pioneering women
Journal of Physics D: Applied Physics (2023) -
Efficient Continuous Light-Driven Electrochemical Water Splitting Enabled by Monolithic Perovskite-Silicon Tandem Photovoltaics
Advanced Materials Technologies (2023) -
Molecular layer deposition of alucone in high aspect ratio trenches: The effect of TMA outgassing on step-coverage
Journal of Vacuum Science and Technology A (2023) -
Effective Hydrogenation of Poly-Si Passivating Contacts by Atomic-Layer-Deposited Nickel Oxide
IEEE Journal of Photovoltaics (2022) -
Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
Solar Energy Materials and Solar Cells (2022)