SEM / FIB workstation, FEI

Nanofabricaction, characterization and manipulation of nanostructures

Name

FEI Nova600i NanoLab

Application

Nanopatterning, x-section Imaging, TEM lamella preparation, EB Lithography

Characteristics

FEG 30kV 20nA resolution 1.1nm at 15kV

Ga LMIS 30kV 20nA resoultuion 7 nm

EDX detector 136 eV resolution

Raith controller for EBL

Chemistries: Pt, W, TEOS, Fe and Co

Kleindiek manipulators

Specimen

Semiconductor substrate maximum 25mmx25mm

User conditions

Requires specific training or supervision

Remarks

No magnetic materials allowed or degassing samples