ASML Pas 5500/1100B scanner

ASML ArF Scanner

Name

ASML PAS5500/1100B

Application

Exposure of ArF DUV Resist

Standard Stack: 38 nm BARC / 225 nm Resist / 90 nm TARC

Characteristics

Exposure using 193 nm ArF Laser

Specimen

8" Wafer compatible, 3" Wafer compatibility conversion pending

User conditions

Requires Engineering Support to Operate

Remarks

Equipment requires specific Masks and applies 4x reduction in Image size