ASML Pass 5500/1100B scanner
ASML ArF Scanner | |
Name | ASML PAS5500/1100B |
Application | Exposure of ArF DUV Resist Standard Stack: 38 nm BARC / 225 nm Resist / 90 nm TARC |
Characteristics | Exposure using 193 nm ArF Laser |
Specimen | 8" Wafer compatible, 3" Wafer compatibility conversion pending |
User conditions | Requires Engineering Support to Operate |
Remarks | Equipment requires specific Masks and applies 4x reduction in Image size |