Karl Suss MA-6 contact aligner
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Name | Karl Suss MA6 contact aligner |
Application | High Resolution Photolithography in a vacuum-contact mode |
Characteristics | 400 nm exp. wavelength is capable of 0.6 micrometer resolution in vacuum contact |
Specimen | Wafer size < or = 4 inch |
User conditions | Requires training or supervision |
Remarks | Half-automatic operated/best resolution in co-using the closed-cover Gyrset Photoresist spinner |