Oxford ICP

Inductively Coupled Plasma etcher  for optical devices

Name

Oxford instruments PlasmaLab 100 ICP

Application

Etching of InP / InGaAs / InGaAsP materials with dielectric masking.

Characteristics

Available chemistries:

- Cl2 / Ar / H2,

- Cl2 / CH4 / H2,

- Cl2 / O2,

- Cl2 / N2,

- CH4 / H2

Temperature range 30-200 ºC

Specimen

III-V semiconductor substrates,

maximum size 3 inch.

User conditions

Requires training or supervision

Remarks