Oxford ICP
Inductively Coupled Plasma etcher for optical devices | |
Name | Oxford instruments PlasmaLab 100 ICP |
Application | Etching of InP / InGaAs / InGaAsP materials with dielectric masking. |
Characteristics | Available chemistries: - Cl2 / Ar / H2, - Cl2 / CH4 / H2, - Cl2 / O2, - Cl2 / N2, - CH4 / H2 Temperature range 30-200 ÂșC |
Specimen | III-V semiconductor substrates, maximum size 3 inch. |
User conditions | Requires training or supervision |
Remarks |
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