Raith EBPG 5150 Electron Beam Lithography

SEM based Electron Beam Lithography equipment

Name

RAITH EBPG 5150

Application

Direct exposure of electron sensitive resists like PMMA, ZEP and HSQ for Micro- and nanopatterning

Characteristics

Acceleration voltages up to 100 kV, probe current up to 1 nA

 

Specimen

Maximum size 3 inch

User conditions

Requires training or supervision

Remarks

 Will be replaced +/- halfway 2016.