Raith EBPG 5150 Electron Beam Lithography (EBL)

SEM based Electron Beam Lithography equipment

Name

RAITH EBPG 5150

Application

Direct exposure of electron sensitive resists like PMMA, ZEP and HSQ for Micro- and nanopatterning

Characteristics

Acceleration voltages up to 100 kV, probe current up to 1 nA

 

Specimen

Maximum size 3 inch

User conditions

Requires training or supervision

Remarks

 Will be replaced +/- halfway 2016.