Raith EBPG 5150 Electron Beam Lithography
SEM based Electron Beam Lithography equipment
RAITH EBPG 5150
Direct exposure of electron sensitive resists like PMMA, ZEP and HSQ for Micro- and nanopatterning
Acceleration voltages up to 100 kV, probe current up to 1 nA
Maximum size 3 inch
Requires training or supervision
Will be replaced +/- halfway 2016.