Sentech InP ICP Reactive Ion Etcher
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Name | Sentech InP ICP Reactive Ion Etcher |
Application | Etching of III-V’s with CH4/H2 chemistry |
Characteristics |
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Specimen | Max. 6 inch |
User conditions | After training the user will have to use the system by themselves |
Remarks | Cl2 is available but no processes have been optimized |