Brewer Science Equipment

Gas phase Deposition of HMDS-primer

Name

Philips / JDS-Uniphase Primer-oven system

Application

Improving fotoresist adhesion by HMDS-deposition on SiOx and SiNxOy surfaces

Characteristics

Optimized process checked through contact-angle measurements

Specimen

Wafer size < or = 3-inch wafers

User conditions

Only used by operator

Remarks

Contact-angle measurement set-up present