Ionwave, Tepla

 

Name

Ionwave, Tepla

Application

Stripping of e-beam and optical resists, surface modification

Characteristics

Max. power 600 W @ 2.45 GHz, min power 200 W. Only oxygen available.

Specimen

From single pieces of mm2 to 25 4 inch wafers in a waferboat or single 6 and 8 inch wafers

User conditions

After a short training users will have to use the system by themselves

Remarks

At high power possible wafer damage. Faraday cage available but not tested