My focus lies on the controlled fabrication and integration of 1-D and 2D-nanomaterials on an industrial-relevant scale. This will prove vital for a new generation of nanoelectronics
Ageeth Bol is an associate professor of Applied Physics at Eindhoven University of Technology, (TU/e). Her areas of expertise include physical chemistry, materials technology and solid-state physics. Current research interests include the fabrication, modification and integration of 1-D and 2-D nanomaterials for (opto)electronics and catalysis. Novel techniques based on selective atomic layer deposition (ALD) and plasma chemistry are being developed to connect new nanomaterials such a graphene and carbon nanotubes to the outside world with metal contacts and dielectrics. This is vital for integrating these materials in future nanoelectronics. Another exciting area of research Bol’s group is working on is the synthesis of two-dimensional transition metal dichalcogenides (2D-TMDs), a new class of ultra-thin semiconductor materials with surprising properties. Atomic layer deposition is being used to tailor the thickness, morphology and electronic properties of these materials on an industrial relevant scale.
Ageeth Bol received her MSc and PhD in Chemistry from Utrecht University. After obtaining her PhD in 2001 she worked for Philips Electronics and at the IBM TJ Watson Research Center in the USA. In 2011 she joined TU/e. In 2012, Ageeth received a prestigious VIDI grant from the NWO (Netherlands Organization for Scientific Research) and in 2014 she was awarded a Consolidator Grant by the ERC (European Research Council).
Strategies to facilitate the formation of free standing MoS2 nanolayers on SiO2 surface by atomic layer deposition: a DFT studyAPL Materials (2018)
Diffraction enhanced transparency in a hybrid gold-graphene THz metasurface43rd International Conference on Infrared Millimeter and Terahertz Waves, IRMMW-THz 2018 (2018)
Broadband optical response of graphene measured by terahertz time-domain spectroscopy and FTIR spectroscopyJournal of Applied Physics (2018)
Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin filmsJournal of Vacuum Science and Technology. A: Vacuum, Surfaces, and Films (2018)
Initial stage of atomic layer deposition of 2D-MoS2 on a SiO2 surfacePhysical Chemistry Chemical Physics (2018)
- Bachelor final project (15 ECTS)
- Plasma processing science and technology
- Bachelor final project (10ECTS)
- Bachelor final project extension general
- Applied natural sciences conceptual
No ancillary activities