Vadim Banine is Professor of Physics and Technology of EUV Lithography in the Elementary Processes in Gas Discharges group at Eindhoven University of Technology. This is a part-time position, which he combines with his work as Director of ASML. <br/><br/>Banine's research interests include EUV lithography, plasma physics, surface physics and chemistry as well as accelerator technology. EUV lithography is a promising technology to make electronic chips smaller and more powerful - a promise that ASML is working on bringing to reality, in collaboration with universities such as TU/e, Twente University and the Russian ISAN. <br/><br/>At ASML, Banine is responsible for general research program definition and roadmapping, managing and coaching research project leaders, external laboratories and projects worldwide and the development of the EUV research process, its knowledge base, working group capacity and external network. <br/><br/>His strong career in industry make Banine an expert on organization and development of research programs and groups, project leadership, combining enterprise and science and bringing results to development. <br/><br/>Banine is a member of the Scientific Advisory Commitee (SAC) at FOM. He has more than 60 patents, is the winner of the ASML patent award and has over 40 publications to his name.
Small projects take about the same time to manage as the large ones, so it is important to find partners able solve a substantial part of the problem on their own.
Vadim Banine holds a cum laude MSc degree from the Moscow Institute of Physics and Technology (Russia). He obtained his PhD from Eindhoven University of Technology (TU/e) in 1994, on the metrology of combustion plasma and shock tubes. He did a postdoc at TU/e in the Laboratory of Heat and Mass Transfer in 1995 and 1996. In 1996, he started working for ASML - first as lead engineer, then as external project coordinator, as head of the ASML laboratory and even later as senior manager of general research. In 2010, Banine became Research Director at ASML and in 2017 he became its Director. He was appointed part-time Professor at TU/e in 2013.
An atomic hydrogen etching sensor for H2 plasma diagnosticsReview of Scientific Instruments (2021)
Morphology change and release of tin and lead micro-particles from substrates in hydrogen plasmaSPIE Advanced Lithography 2021 (2021)
Addendum: Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy (2018 J PHYS D APPL PHYS 52 034004)Journal of Physics D: Applied Physics (2020)
Time-resolved ion energy distribution functions in the afterglow of an EUV-induced plasmaApplied Physics Letters (2019)
EUV-induced plasma: a peculiar phenomenon of a modern lithographic technologyApplied Sciences (2019)
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