prof.dr.ir. W.M.M. (Erwin) Kessels - Expertise

Kessels, prof.dr.ir. W.M.M.
Address :
Technische Universiteit Eindhoven
P.O. Box 513
5600 MB EINDHOVEN
Department :
Department of Applied Physics
Section :
Plasma & Materials Processing
Positioncategory :
Professor (HGL)
Position :
Full Professor
Room :
FLX 3.092
Tel :
+31 40-247 3477
Tel (internal) :
3477
Email :
w.m.m.kessels@tue.nl

Expertise

  • E16000 - Nanotechnology
  • D12600 - Atomic physics and molecular physics
  • D12700 - Gases, fluid dynamics, plasma physics
  • Plasma physics
  • Solar cells

Biography

Biography

Erwin Kessels is a full professor at the Department of Applied Physics of the Eindhoven University of Technology TU/e (The Netherlands). He is also the scientific director of the NanoLab@TU/e facilities which provides full-service and open-access clean room infrastructure for R&D in nanotechnology. Erwin received his M.Sc. and Ph.D. degree (cum laude) in Applied Physics from the TU/e in 1996 and 2000, respectively. His doctoral thesis work was partly carried out at the University of California Santa Barbara and as a postdoc he was affiliated to the Colorado State University and Philipps University in Marburg (Germany). In 2004/2005 he spent a six-months sabbatical at the University of California Berkeley. In 2007 the American Vacuum Society awarded him the Peter Mark Memorial Award for "pioneering work in the application and development of in situ plasma and surface diagnostics to achieve a molecular understanding of thin film growth". In recognition of his research, he received a NWO Vici grant in 2010 to set up a large research program on “nanomanufacturing” in order to bridge the gap between nanoscience/nanotechnology and industrial application. He was appointed full professor in 2011. His research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced) chemical vapor deposition (CVD) and atomic layer deposition (ALD) for a wide variety of applications, mostly within the areas of nanoelectronics and photovoltaics. Within the field of ALD, he has contributed most prominently by his work on plasma-assisted ALD, his research related to ALD for photovoltaics, and ALD for nanopatterning (including area-selective ALD). He has been the chair of the International Conference on Atomic Layer Deposition in 2008 (Bruges, Belgium) and he frequently (co-)organizes workshops on ALD-related topics (ALD4PV, ALD fundamentals, ALD for 2D materials, ALD short courses, etc.). Erwin is active within the American Vacuum Society, has been the president of the Netherlands Vacuum Society, and is currently an associate editor of the Journal of Vacuum Science and Technology. Erwin has published over 250 papers, has given 75+ invited presentations, and holds 2 patents. In his spare time he likes to do sports, travel and enjoy (modern) art.