Name

Karl Suss MA6 contact aligner

Application

High Resolution Photolithography in a vacuum-contact mode

Characteristics

400 nm exp. wavelength is capable of 0.6 micrometer resolution in vacuum contact

Specimen

Wafer size < or = 4 inch

User conditions

Requires training or supervision

Remarks

Half-automatic operated/best resolution in co-using the closed-cover Gyrset Photoresist spinner