Method for applying a thin film barrier stack to a device with microstructures, and device provided with such a thin film barrier stack

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Mischke, W.S., Assche, van, F.J.H., Dings, F.C., Vangheluwe, R.T., Kessels, W.M.M. & Sanden, van de, M.C.M. (2005). Method for applying a thin film barrier stack to a device with microstructures, and device provided with such a thin film barrier stack. Patent No. WO2005015655. Lees meer: Medialink/Full text

Abstract

 

A method for applying a thin film barrier stack to a device with microstructures, such as, for instance, an OLED, wherein the thin film barrier stack forms a barrier to at least moisture and oxygen, wherein the stack is built up from a combination of org. and inorg. layers, characterized in that a first org. intermediate layer is applied, wherein the org. intermediate layer is applied in liq. form, wherein the viscosity of the org. intermediate layer liq. is so low that grooves, hollows and like narrow cavities are at least partly filled up with the org. liq. under the influence of capillary forces while other parts of the device are only covered with a thin layer of the org. liq., such that a layer of variable thickness is formed.