Photodetachment effect in a radio frequency plasma in CF4

Tijdschriftartikel

Jauberteau, J.L., Meeusen, G.J., Haverlag, M., Kroesen, G.M.W. & Hoog, de, F.J. (1989). Photodetachment effect in a radio frequency plasma in CF4. Applied Physics Letters, 55(25), 2597-2599. In Scopus Cited 29 times.

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Abstract

 

Experiments to study negative ion densities have been carried out using the photodetachment effect in a rf plasma in CF4. Electrons are detached from the negative ions under the influence of the pulse of a Nd:YAG laser. The induced increase of the electron density is measured as a function of time using the shift of the resonance frequency of a microwave cavity containing the plasma. The negative ion density [F-] is found to be about (4±1)×1015 m-3, a factor 4±1 higher than the electron density.