Temescal FC2000 Electron Beam Evaporator
Name | Temescal FC2000 |
Application | Deposition of thin metal films for electrical contacts. |
Characteristics | Deposition of thin layers (layer stacks) of Ti, Pt and Au in the range of 10-300 nm. Loadlock. |
Specimen | Maximum wafer size 3 inch. |
User conditions | Requires training or supervision |
Remarks |
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