Temescal FC2000 Electron Beam Evaporator

Name

Temescal FC2000

Application

Deposition of thin metal films for electrical contacts.

Characteristics

Deposition of thin layers (layer stacks) of Ti, Pt and Au in the range of 10-300 nm. Loadlock.

Specimen

Maximum wafer size 3 inch.

User conditions

Requires training or supervision

Remarks