Rapid Thermal Annealer 1, Jipelec
Rapid thermal annealer | |
Name | Jipilec Jetfirst 100 |
Application | Annealing Crystalisation |
Characteristics | Annealing with infrared light. Annealing of coated Si and glass substrates |
Specimen | Max 4 inch |
User conditions | Only used by operator |
Remarks | Process gasses: N2, O2, Ar and H2 |