ALD equipment
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Oxford Instruments OpAL
Atomic layer deposition (ALD) reactor, both plasma assisted and thermal. Open load system equipped three precursors-inputs plus a...
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Oxford Instruments FlexAL 1
Atomic layer deposition (ALD) reactor, both plasma assisted and thermal. Equipped with a loadlock and four precursors-inputs.
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Oxford Instruments FlexAL 2
Atomic layer deposition (ALD) reactor, both plasma assisted and thermal. Equipped with a loadlock and six precursors-inputs.
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Oxford Instruments FlexAL 2D
Atomic layer deposition (ALD) reactor, both plasma assisted and thermal. Equipped with a loadlock and six precursors-inputs.
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