Brewer Science Equipment
Gas phase Deposition of HMDS-primer | |
Name | Philips / JDS-Uniphase Primer-oven system |
Application | Improving fotoresist adhesion by HMDS-deposition on SiOx and SiNxOy surfaces |
Characteristics | Optimized process checked through contact-angle measurements |
Specimen | Wafer size < or = 3-inch wafers |
User conditions | Only used by operator |
Remarks | Contact-angle measurement set-up present |