SEM / FIB workstation, FEI
Nanofabricaction, characterization and manipulation of nanostructures | |
Name | FEI Nova600i NanoLab |
Application | Nanopatterning, x-section Imaging, TEM lamella preparation, EB Lithography |
Characteristics | FEG 30kV 20nA resolution 1.1nm at 15kV Ga LMIS 30kV 20nA resoultuion 7 nm EDX detector 136 eV resolution Raith controller for EBL Chemistries: Pt, W, TEOS, Fe and Co Kleindiek manipulators |
Specimen | Semiconductor substrate maximum 25mmx25mm |
User conditions | Requires specific training or supervision |
Remarks | No magnetic materials allowed or degassing samples |