Semi Automatic Mask Aligner EVG 620NT
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Name | Semi Automatic Mask Aligner EVG 620NT |
Application | Photo lithography and aligning wafers to each other for bonding |
Characteristics | 500W lamp with broadband optics. Lithography alignment 1 micron, bond alignment accuracy under investigation. 5 inch mask possible to use, 6 inch preferred for optical litho |
Specimen | 3 inch maximum size, smaller pieces and 2 inch wafers possible for bond alignment. For optical litho maximum size is 4 inch |
User conditions | After training the user will have to use the system by themselves |
Remarks | For optical litho there is only 1 positive resist available. |