Ionwave, Tepla
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Name | Ionwave, Tepla |
Application | Stripping of e-beam and optical resists, surface modification |
Characteristics | Max. power 600 W @ 2.45 GHz, min power 200 W. Only oxygen available. |
Specimen | From single pieces of mm2 to 25 4 inch wafers in a waferboat or single 6 and 8 inch wafers |
User conditions | After a short training users will have to use the system by themselves |
Remarks | At high power possible wafer damage. Faraday cage available but not tested |