Adrie Mackus
Department / Institute
RESEARCH PROFILE
Adriaan J.M. Mackus is Associate Professor in the Plasma and Materials Processing group within the Applied Physics department at Eindhoven University of Technology (TU/e). His research encompasses thin film deposition and etching for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication.
ACADEMIC BACKGROUND
Adrie Mackus earned his M.Sc. and Ph.D. degrees (both with highest honors) in Applied Physics from TU/e in 2009 and 2013, respectively. Adrie worked as a postdoc at the department of Chemical Engineering at Stanford University in 2014-2016. He returned to TU/e in 2016, where he received tenure in 2019. His current research encompasses atomic layer deposition (ALD) and etching (ALE) for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication. This involves application-oriented projects funded by industrial partners, as well as fundamental studies of the underlying mechanisms using in-situ techniques. Adrie chaired the 2nd Area Selective Deposition workshop (ASD2017) in Eindhoven in 2017. In 2020 he was awarded a VIDI grant from the Netherlands Organization of Scientific Research (NWO) and a Starting Grant from the European Research Council (ERC).
Key Publications
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Adriaan J.M. Mackus,Marc J.M. Merkx,Wilhelmus M.M. Kessels
From the bottom-up: toward area-selective atomic layer deposition with high selectivity
Chemistry of Materials (2019) -
A. Mameli,M.J.M. Merkx,B. Karasulu,F. Roozeboom,W.M.M. Kessels,A.J.M. MacKus
Area-selective atomic layer deposition of SiO2 using acetylacetone as a chemoselective inhibitor in an ABC-type cycle
ACS Nano (2017) -
Adrie Mackus,J.R. Schneider,C. MacIsaac,J.G. Baker,Stacey F. Bent
Synthesis of doped, ternary, and quaternary materials by atomic layer deposition: a review
Chemistry of Materials (2019)
Ancillary Activities
No ancillary activities