Adrie Mackus is Assistant Professor in the Plasma and Materials Processing group within the Applied Physics department at Eindhoven University of Technology (TU/e).
Adrie Mackus earned his M.Sc. and Ph.D. degrees (both cum laude) in Applied Physics at Eindhoven University of Technology TU/e in 2009 and 2013, respectively. His doctoral thesis work “Atomic Layer Deposition of Platinum: From Surface Reactions to Nanopatterning” was carried out in close collaboration with the company FEI Electron Optics, and included a visit to Purdue University, USA in 2012. Mackus worked as a postdoctoral researcher at the department of Chemical Engineering at Stanford University from 2014 to 2016, for which he received a personal NWO Rubicon grant in 2014. At Stanford, he focused on the study of the atomic layer deposition (ALD) of ternary materials using in-situ techniques. After his postdoc, Mackus returned to TU/e in 2016 as Assistant Professor.
Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etchingChemistry of Materials (2019)
Area-selective atomic layer deposition of ZnO by area activation using electron beam-induced depositionChemistry of Materials (2019)
From the bottom-up: toward area-selective atomic layer deposition with high selectivityChemistry of Materials (2019)
Synthesis of doped, ternary, and quaternary materials by atomic layer deposition: a reviewChemistry of Materials (2019)
Isotropic atomic layer etching of ZnO using Acetylacetone and O2 plasmaACS Applied Materials & Interfaces (2018)