Adrie Mackus
Department / Institute
RESEARCH PROFILE
Adriaan J.M. Mackus is Assistant Professor in the Plasma and Materials Processing group within the Applied Physics department at Eindhoven University of Technology (TU/e). His research encompasses thin film deposition and etching for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication.
ACADEMIC BACKGROUND
Adrie Mackus earned his M.Sc. and Ph.D. degrees (both cum laude) in Applied Physics at Eindhoven University of Technology TU/e in 2009 and 2013, respectively. His doctoral thesis work “Atomic Layer Deposition of Platinum: From Surface Reactions to Nanopatterning” was carried out in close collaboration with the company FEI Electron Optics, and included a visit to Purdue University, USA in 2012. Mackus worked as a postdoctoral researcher at the department of Chemical Engineering at Stanford University from 2014 to 2016, for which he received a personal NWO Rubicon grant in 2014. At Stanford, he focused on the study of the atomic layer deposition (ALD) of ternary materials using in-situ techniques. After his postdoc, Mackus returned to TU/e in 2016 as Assistant Professor. Adrie is a founding member of the Early Career Investigator (ECI) network within COST action HERALD and chaired the 2nd Area Selective Deposition workshop (ASD2017) in Eindhoven in 2017.
Key Publications
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Adriaan J.M. Mackus,Marc J.M. Merkx,Wilhelmus M.M. Kessels
From the bottom-up: toward area-selective atomic layer deposition with high selectivity
Chemistry of Materials (2019) -
A. Mameli,M.J.M. Merkx,B. Karasulu,F. Roozeboom,W.M.M. Kessels,A.J.M. MacKus
Area-selective atomic layer deposition of SiO2 using acetylacetone as a chemoselective inhibitor in an ABC-type cycle
ACS Nano (2017) -
Adrie Mackus,J.R. Schneider,C. MacIsaac,J.G. Baker,Stacey F. Bent
Synthesis of doped, ternary, and quaternary materials by atomic layer deposition: a review
Chemistry of Materials (2019)
Ancillary Activities
No ancillary activities