Adrie Mackus is Assistant Professor in the Plasma and Materials Processing group within the Applied Physics department at Eindhoven University of Technology (TU/e).
Adrie Mackus earned his M.Sc. and Ph.D. degrees (both cum laude) in Applied Physics at Eindhoven University of Technology TU/e in 2009 and 2013, respectively. His doctoral thesis work “Atomic Layer Deposition of Platinum: From Surface Reactions to Nanopatterning” was carried out in close collaboration with the company FEI Electron Optics, and included a visit to Purdue University, USA in 2012. Mackus worked as a postdoctoral researcher at the department of Chemical Engineering at Stanford University from 2014 to 2016, for which he received a personal NWO Rubicon grant in 2014. At Stanford, he focused on the study of the atomic layer deposition (ALD) of ternary materials using in-situ techniques. After his postdoc, Mackus returned to TU/e in 2016 as Assistant Professor.
Isotropic atomic layer etching of ZnO using Acetylacetone and O2 plasmaACS Applied Materials & Interfaces (2018)
Atomic layer deposition of cobalt using H2-, N2-, and NH3-based plasmasJournal of Physical Chemistry C (2018)
Approaches and opportunities for area-selective atomic layer deposition2018 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2018 (2018)
New approaches for area-selective atomic layer deposition of oxidesAbstracts of Papers of the American Chemical Society (2018)
Area-selective atomic layer deposition of metal oxides on noble metals through catalytic oxygen activationChemistry of Materials (2018)
- Bachelor final project (15 ECTS)
- Plasma processing science and technology
- Bachelor final project (10ECTS)
- Bachelor final project extension general
- Applied natural sciences formal
No ancillary activities