We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
Meet some of our Researchers
Our most recent peer reviewed publications
From the bottom-up: toward area-selective atomic layer deposition with high selectivityChemistry of Materials (2019)
Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reactionElectrochemistry Communications (2019)
Minimizing voltage loss in wide-bandgap perovskites for tandem solar cellsACS Energy Letters (2019)
Explorative studies of novel silicon surface passivation materialsSolar Energy Materials and Solar Cells (2018)
Strategies to facilitate the formation of free standing MoS2 nanolayers on SiO2 surface by atomic layer deposition: a DFT studyAPL Materials (2018)