We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
Our most recent peer reviewed publications
Investigation of crystalline silicon surface passivation by positively charged POx/Al2O3 stacksSolar Energy Materials and Solar Cells (2018)
Mechanisms of elementary hydrogen ion-surface interactions during multilayer graphene etching at high surface temperature as a function of fluxCarbon (2018)
Optical and electrical properties of H2 plasma-treated ZnO films prepared by atomic layer deposition using supercyclesMaterials Science in Semiconductor Processing (2018)
Surface fluorination of ALD TiO2 electron transport layer for efficient planar Perovskite solar cellsAdvanced Materials Interfaces (2018)
Atomic-layer deposited Nb2O5 as transparent passivating electron contact for c-Si solar cellsSolar Energy Materials and Solar Cells (2018)