We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
Meet some of our Researchers
Our most recent peer reviewed publications
Explorative studies of novel silicon surface passivation materialsSolar Energy Materials and Solar Cells (2018)
Investigation of crystalline silicon surface passivation by positively charged POx/Al2O3 stacksSolar Energy Materials and Solar Cells (2018)
Mechanisms of elementary hydrogen ion-surface interactions during multilayer graphene etching at high surface temperature as a function of fluxCarbon (2018)
Low-temperature plasma-assisted atomic-layer-deposited SnO2 as an electron transport layer in planar Perovskite solar cellsACS Applied Materials & Interfaces (2018)
Passivating electron-selective contacts for silicon solar cells based on an a-SiProgress in Photovoltaics: Research and Applications (2018)