We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
Meet some of our Researchers
Richard van de Sanden
Our most recent peer reviewed publications
Electrochemistry of sputtered hematite photoanodesACS Omega (2019)
Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etchingChemistry of Materials (2019)
Nanosecond pulsed discharge for CO 2 conversionJournal of Physical Chemistry C (2019)
Rear-emitter silicon heterojunction solar cells with atomic layer deposited ZnO:Al serving as an alternative transparent conducting oxide to In2O3:SnSolar Energy Materials and Solar Cells (2019)
Electronic effects determine the selectivity of planar Au-Cu bimetallic thin films for electrochemical CO2 reductionACS Applied Materials & Interfaces (2019)