We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
Work with us!
Please check out the TU/e Vacancies page for further opportunities within our group.
All positions are open from May 15, 2019, and are open only to female candidates in the framework of the new Irène Curie Fellowship program of TU/e. Review of applications will begin immediately upon receipt, and continue until the positions are filled, with the last date for applications being November 15, 2019.
Meet some of our Researchers
Richard van de Sanden
Our most recent peer reviewed publications
Co-electrolysis of H2O and CO2 on exsolved Ni nanoparticles for efficient syngas generation at controllable H2/CO ratiosApplied Catalysis. B, Environmental (2019)
Quantifying methane vibrational and rotational temperature with Raman scatteringJournal of Quantitative Spectroscopy and Radiative Transfer (2019)
Role of electron–ion dissociative recombination in CH 4 microwave plasma on basis of simulations and measurements of electron energyPlasma Chemistry and Plasma Processing (2019)
Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3Applied Physics Letters (2019)
Initial growth study of atomic-layer deposition of Al2O3 by vibrational sum-frequency generationLangmuir (2019)