We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
Meet some of our Researchers
Richard van de Sanden
Our most recent peer reviewed publications
Quantifying methane vibrational and rotational temperature with Raman scatteringJournal of Quantitative Spectroscopy and Radiative Transfer (2019)
Boosting the performance of WO3/n-Si heterostructures for photoelectrochemical water splittingAdvanced Energy Materials (2019)
Phonon engineering in twinning superlattice nanowiresNano Letters (2019)
Transition in layer structure of atomic/molecular layer deposited ZnO-zincone multilayersJournal of Vacuum Science and Technology. A: Vacuum, Surfaces, and Films (2019)
Edge-site nano-engineering of WS2 by low temperature plasma-enhanced atomic layer deposition for electrocatalytic hydrogen evolutionChemistry of Materials (2019)