We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
Meet some of our Researchers
Our most recent peer reviewed publications
Silicon surface passivation by transparent conductive zinc oxideJournal of Applied Physics (2019)
On the role of micro-porosity in affecting the environmental stability of atomic/molecular layer deposited (ZnO) : A (Zn-O-CDalton Transactions (2019)
Data on dopant characteristics and band alignment of CdTe cells with and without a ZnO highly-resistive-transparent buffer layerData in Brief (2019)
Performance and Thermal Stability of an a-Si:H/TiOx/Yb Stack as an Electron-Selective Contact in Silicon Heterojunction Solar CellsACS Applied Energy Materials (2019)
Area-selective atomic layer deposition of ZnO by area activation using electron beam-induced depositionChemistry of Materials (2019)