We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
Meet some of our Researchers
Our most recent peer reviewed publications
Overpotential analysis of alkaline and acidic alcohol electrolysers and optimized membrane-electrode assembliesInternational Journal of Hydrogen Energy (2019)
Status and prospects of plasma-assisted atomic layer depositionJournal of Vacuum Science and Technology. A: Vacuum, Surfaces, and Films (2019)
Silicon surface passivation by transparent conductive zinc oxideJournal of Applied Physics (2019)
Diffraction enhanced transparency in a hybrid gold-graphene THz metasurfaceAPL Photonics (2019)
Enhancement of the photocurrent and efficiency of CdTe solar cells suppressing the front contact reflection using a highly-resistive ZnO buffer layerSolar Energy Materials and Solar Cells (2019)